24 February 2009 Advances in diffractive nanophotonics enabled by commercial photoreduction lithography
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Abstract
We describe monolithic advanced-function diffraction grating arrays for instantaneous ultrawide spectral coverage and other uses that have inherent spectral and spatial self-calibration features. This new technology is made possible by recent advances in deep ultraviolet (DUV) reduction-lithographic fabrication.
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Christoph M. Greiner, Dmitri Iazikov, Thomas W. Mossberg, "Advances in diffractive nanophotonics enabled by commercial photoreduction lithography", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050L (24 February 2009); doi: 10.1117/12.811619; https://doi.org/10.1117/12.811619
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