Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components

Menelaos K. Poutous; Zach Roth; Kaia Buhl; Aaron Pung; Raymond C. Rumpf; Eric G. Johnson

doi:10.1117/12.814514

24 February 2009 Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components

Menelaos K. Poutous, Zach Roth, Kaia Buhl, Aaron Pung, Raymond C. Rumpf, Eric G. Johnson

Author Affiliations +

Proceedings Volume 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II; 72050Y (2009) https://doi.org/10.1117/12.814514
Event: SPIE MOEMS-MEMS: Micro- and Nanofabrication, 2009, San Jose, California, United States

Abstract

Large-scale fabrication of micro-optical Guided-Mode-Resonance (GMR) components using VLSI techniques is desirable, due to the planar system integration capabilities it enables, especially with laser resonator technology. However, GMR performance is dependent on within-wafer as well as wafer-to-wafer lithographic process variability, and pattern transfer fidelity of the final component in the substrate. The fabrication of lithographs below the g-line stepper resolution limit is addressed using multiple patterning. We report results from computational simulations, fabrication and optical reflectance measurements of GMR mirrors and filters (designed to perform around the wavelength of 1550nm), with correlations to lithographic parameter variability, such as photoresist exposure range and etch depth. The dependence of the GMR resonance peak wavelength, peak bandwidth are analyzed as a function of photolithographic fabrication tolerances and process window.

Citation Download Citation

Menelaos K. Poutous, Zach Roth, Kaia Buhl, Aaron Pung, Raymond C. Rumpf, and Eric G. Johnson "Correlation of fabrication tolerances with the performance of guided-mode-resonance micro-optical components", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050Y (24 February 2009); https://doi.org/10.1117/12.814514

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