9 February 2009 Low-cycle fatigue testing of silicon resonators
Author Affiliations +
This paper presents a testing methodology for measuring the low cycle fatigue properties of single-crystal silicon thin films using kHz-frequency resonators. The dynamic behavior of the fatigue structures is thoroughly characterized to allow accurate measurements of stresses (±0.1 GPa) and fatigue lives (±250 cycles). The tests consist of applying successive bursts of small numbers of cycles (as low as ~500 cycles) and measuring the resonant frequency in between each burst. Continuous damage accumulation, beginning after the first burst, is observed based on the decrease in resonant frequency of the resonant structure.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pierre-Olivier Theillet, Pierre-Olivier Theillet, Olivier Pierron, Olivier Pierron, "Low-cycle fatigue testing of silicon resonators", Proc. SPIE 7206, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS and Nanodevices VIII, 72060B (9 February 2009); doi: 10.1117/12.808180; https://doi.org/10.1117/12.808180

Back to Top