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17 November 2008 Robust self-matching based focus measure
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Proceedings Volume 7266, Optomechatronic Technologies 2008; 72661P (2008)
Event: International Symposium on Optomechatronic Technologies, 2008, San Diego, California, United States
This paper proposes a novel focus measure based on self-matching methods. A unique pencil-shaped profile is identified by comparing the similarity between patterns extracted around their neighborhood in each scene. Based on this, a new criterion function, CPV, is defined to evaluate focused or defocused scenes. OCM is recommended due to its invariance with regards to contrasts. Experiments using a telecentric lens are implemented to demonstrate the efficiency of proposed measure. Comparing OCM-based focus measure with conventional focus measures shows that OCM-based CPV is robust against illuminations. Using this method, pan-focused images are composed and depth information is represented.
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Yuan Li, Hidenori Takauji, Shun'ichi Kaneko, Takayuki Tanaka, and Isao Ohmura "Robust self-matching based focus measure", Proc. SPIE 7266, Optomechatronic Technologies 2008, 72661P (17 November 2008);

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