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Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication
Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography
Carbon film growth on model electron-irradiated MLM cap layer: interaction of benzene and MMA vapor with TiO2 surface
Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons
Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates
High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning