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17 March 2009 Xenon DPP source technologies for EUVL exposure tools
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Abstract
The learning gained in previous developments for EUV Micro Exposure and Alpha Tools builds the basis for the EUVL source development at XTREME technologies and Philips EUV. Field data available from operation of these tools are in use for continuous improvements in core technology areas such as plasma generation and forming, component reliability, debris mitigation and optical performance. Results from integration and operation of alpha tool sources are presented in the areas power performance, component lifetime and debris mitigation efficiency. The analysis results and simulation work of the realized EUV source concept are discussed and innovative concepts for component and module improvements are introduced. The technological limit for the Xenon based sources seems to be reached on alpha performance level. Therefore the next EUV source generations are based on Tin to increase the efficiency and full performance of those sources. For the Betatool and HVM source generations a joint development work between XTREME technologies and Philips EUV is introduced. The related work is content of another presentation of this conference.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yoshioka, Denis Bolshukhin, Marc Corthout, Günther H. Derra, Sven Götze, Jeroen Jonkers, Jürgen Kleinschmidt, Rainer Müller, Max C. Schürmann, Guido Schriever, Rob Snijkers, and Peter Zink "Xenon DPP source technologies for EUVL exposure tools", Proc. SPIE 7271, Alternative Lithographic Technologies, 727109 (17 March 2009); https://doi.org/10.1117/12.814100
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