Protection efficiency of a standard compliant EUV reticle handling solution

Long He; John Lystad; Stefan Wurm; Kevin Orvek; Jaewoong Sohn; Andy Ma; Patrick Kearney; Steve Kolbow; David Halbmaier

doi:10.1117/12.814304

18 March 2009 Protection efficiency of a standard compliant EUV reticle handling solution

Long He, John Lystad, Stefan Wurm, Kevin Orvek, Jaewoong Sohn, Andy Ma, Patrick Kearney, Steve Kolbow, David Halbmaier

Proceedings Volume 7271, Alternative Lithographic Technologies; 72710I (2009) https://doi.org/10.1117/12.814304
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

For successful implementation of extreme ultraviolet lithography (EUVL) technology for late cycle insertion at 32 nm half-pitch (hp) and full introduction for 22 nm hp high volume production, the mask development infrastructure must be in place by 2010. The central element of the mask infrastructure is contamination-free reticle handling and protection. Today, the industry has already developed and balloted an EUV pod standard for shipping, transporting, transferring, and storing EUV masks. We have previously demonstrated that the EUV pod reticle handling method represents the best approach in meeting EUVL high volume production requirements, based on then state-of-the-art inspection capability at ~53nm polystyrene latex (PSL) equivalent sensitivity. In this paper, we will present our latest data to show defect-free reticle handling is achievable down to 40 nm particle sizes, using the same EUV pod carriers as in the previous study and the recently established world's most advanced defect inspection capability of ~40 nm SiO₂ equivalent sensitivity. The EUV pod is a worthy solution to meet EUVL pilot line and pre-production exposure tool development requirements. We will also discuss the technical challenges facing the industry in refining the EUV pod solution to meet 22 nm hp EUVL production requirements and beyond.

Citation Download Citation

Long He, John Lystad, Stefan Wurm, Kevin Orvek, Jaewoong Sohn, Andy Ma, Patrick Kearney, Steve Kolbow, and David Halbmaier "Protection efficiency of a standard compliant EUV reticle handling solution", Proc. SPIE 7271, Alternative Lithographic Technologies, 72710I (18 March 2009); https://doi.org/10.1117/12.814304

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