Step and flash imprint lithography for manufacturing patterned media

Cynthia Brooks; Gerard M. Schmid; Mike Miller; Steve Johnson; Niyaz Khusnatdinov; Dwayne LaBrake; Douglas J. Resnick; S. V. Sreenivasan

doi:10.1117/12.815016

17 March 2009 Step and flash imprint lithography for manufacturing patterned media

Cynthia Brooks, Gerard M. Schmid, Mike Miller, Steve Johnson, Niyaz Khusnatdinov, Dwayne LaBrake, Douglas J. Resnick, S. V. Sreenivasan

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72711L (2009) https://doi.org/10.1117/12.815016
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits per square inch. Step and Flash Imprint Lithography (S-FIL) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable S-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, and dual-sided imprinting. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dualsided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

Citation Download Citation

Cynthia Brooks, Gerard M. Schmid, Mike Miller, Steve Johnson, Niyaz Khusnatdinov, Dwayne LaBrake, Douglas J. Resnick, and S. V. Sreenivasan "Step and flash imprint lithography for manufacturing patterned media", Proc. SPIE 7271, Alternative Lithographic Technologies, 72711L (17 March 2009); https://doi.org/10.1117/12.815016

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