17 March 2009 Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates
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Abstract
A computer-controlled laser beam recorder with a wavelength of 405 nm has been employed for patterning the deposited resist with feature sizes varying from a few hundreds of nanometers to tens of micrometers. Four inch silicon templates for hot embossing source/ drain electrodes and metallic circuit for a disposable biosensor were obtained. SEM and optical microscopy reveal accurate transfer of developed photoresist structures into the underlying silicon wafer after plasma dry etching. Etch depths between 100 - 600 nm were obtained on the templates, and were further transferred into the imprinted plastic substrate and the metallic layer.
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Marius G. Ivan, Marius G. Ivan, Jean-Baptiste Vaney, Jean-Baptiste Vaney, Dick Verhaart, Dick Verhaart, Erwin R. Meinders, Erwin R. Meinders, } "Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates", Proc. SPIE 7271, Alternative Lithographic Technologies, 72711S (17 March 2009); doi: 10.1117/12.814481; https://doi.org/10.1117/12.814481
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