19 March 2009 Characterization of a 0.25NA full-field EUV exposure tool
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The performance of a 0.25NA full-field EUV exposure tool is characterized in terms of CD uniformity, focus and overlay control, as well as dose uniformity. In addition to the characterization of the scanner, we explore the use of scatterometry techniques for the measurements of extremely fine resolution features, with critical dimensions below 40 nm. The stability of the scanner performance over an extended period of time is assessed.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oleg Kritsun, Oleg Kritsun, Bruno La Fontaine, Bruno La Fontaine, Yudong Hao, Yudong Hao, Jie Li, Jie Li, Obert Wood, Obert Wood, Sudharshanan Raghunathan, Sudharshanan Raghunathan, Tim Brunner, Tim Brunner, Chiew-Seng Koay, Chiew-Seng Koay, Hiroyuki Mizuno, Hiroyuki Mizuno, } "Characterization of a 0.25NA full-field EUV exposure tool", Proc. SPIE 7271, Alternative Lithographic Technologies, 727121 (19 March 2009); doi: 10.1117/12.816545; https://doi.org/10.1117/12.816545

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