18 March 2009 Evaluation at the intermediate focus for EUV light source
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We are developing a CO2 laser driven Sn plasma light source for HVM EUVL. This source enables cost-effective high-conversion efficiency (CE >4%) and EUV power scaling. To evaluate light source characteristics we developed a metrology tool for the EUV and for the out of band (DUV, IR) wavelength region. The EUV plasma light source emits radiation ranging from the EUV to the IR. To evaluate a particular wavelength region, spectral purity filters are used to select the region of interest. For the in-band EUV emission the power, the energy stability and the radiation profile are measured. The power is measured with an attenuating filter and a powermeter. The energy stability is measured with a filterd X-ray diode. The radiation profile is measured with a phosphor plate and a VIS-CCD camera. For the out of band emission, the radiated power is measured with an attenuating filter and a powermeter. The out of band region includes the CO2 laser which is partly scattered by the plasma and reflected towards the IF and needs therefore to be included into the measurement.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Suganuma, Takashi Suganuma, Georg Soumagne, Georg Soumagne, Masato Moriya, Masato Moriya, Tamotsu Abe, Tamotsu Abe, Akira Sumitani, Akira Sumitani, Akira Endo, Akira Endo, "Evaluation at the intermediate focus for EUV light source", Proc. SPIE 7271, Alternative Lithographic Technologies, 727133 (18 March 2009); doi: 10.1117/12.813494; https://doi.org/10.1117/12.813494


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