Development of a high-pulse-rate EUV source

Stephen F. Horne; Fred M. Niell; Matthew J. Partlow; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow; Deborah Gustafson

doi:10.1117/12.813765

18 March 2009 Development of a high-pulse-rate EUV source

Stephen F. Horne; Fred M. Niell; Matthew J. Partlow; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow; Deborah Gustafson

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713A (2009) https://doi.org/10.1117/12.813765
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The Energetiq EQ-10 is a medium-power (10 W/2π, 13.5nm +/- 1%, Xenon) EUV source suitable for a variety of mirror testing, resist exposure, and defect inspection applications. The EQ-10 was designed to operate at a pulse frequency of 1 to 2 kHz¹. However, exposure equipment appropriate for High Volume Manufacturing (HVM) requires sources which are projected to operate at 10 kHz or greater². To minimize technical risk in infrastructure development programs now under way in support of future HVM production, scaling of various physical processes with pulse rate require investigation. A program to redesign the EQ-10 to operate at 10 kHz pulse rate has been completed. We report here on the design process and the operating characteristics of the high-frequency source.

Citation Download Citation

Stephen F. Horne, Fred M. Niell, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, Paul A. Blackborow, Deborah Gustafson, "Development of a high-pulse-rate EUV source", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713A (18 March 2009); doi: 10.1117/12.813765; https://doi.org/10.1117/12.813765

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