18 March 2009 Development of a high-pulse-rate EUV source
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Proceedings Volume 7271, Alternative Lithographic Technologies; 72713A (2009); doi: 10.1117/12.813765
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
The Energetiq EQ-10 is a medium-power (10 W/2π, 13.5nm +/- 1%, Xenon) EUV source suitable for a variety of mirror testing, resist exposure, and defect inspection applications. The EQ-10 was designed to operate at a pulse frequency of 1 to 2 kHz1. However, exposure equipment appropriate for High Volume Manufacturing (HVM) requires sources which are projected to operate at 10 kHz or greater2. To minimize technical risk in infrastructure development programs now under way in support of future HVM production, scaling of various physical processes with pulse rate require investigation. A program to redesign the EQ-10 to operate at 10 kHz pulse rate has been completed. We report here on the design process and the operating characteristics of the high-frequency source.
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Stephen F. Horne, Fred M. Niell, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, Paul A. Blackborow, Deborah Gustafson, "Development of a high-pulse-rate EUV source", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713A (18 March 2009); doi: 10.1117/12.813765; https://doi.org/10.1117/12.813765
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KEYWORDS
Plasma

Extreme ultraviolet

Magnetism

Capacitors

Modulators

Switches

Inductance

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