18 March 2009 Inspection 13.2-nm table-top full-field microscope
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We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of high resolution table-top imaging systems for actinic defect characterization.
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F. Brizuela, F. Brizuela, Y. Wang, Y. Wang, C. A. Brewer, C. A. Brewer, F. Pedaci, F. Pedaci, W. Chao, W. Chao, E. H. Anderson, E. H. Anderson, Y. Liu, Y. Liu, K. A. Goldberg, K. A. Goldberg, P. P. Naulleau, P. P. Naulleau, P. W. Wachulak, P. W. Wachulak, M. C. Marconi, M. C. Marconi, D. T. Attwood, D. T. Attwood, J. J. Rocca, J. J. Rocca, C. S. Menoni, C. S. Menoni, "Inspection 13.2-nm table-top full-field microscope", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713F (18 March 2009); doi: 10.1117/12.814320; https://doi.org/10.1117/12.814320

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