18 March 2009 Collecting EUV mask images through focus by wavelength tuning
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Abstract
Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the the relative advantages that this data collection technique affords.
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Kenneth A. Goldberg, Iacopo Mochi, Sungmin Huh, "Collecting EUV mask images through focus by wavelength tuning", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713N (18 March 2009); doi: 10.1117/12.824433; https://doi.org/10.1117/12.824433
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