18 March 2009 Flare compensation for EUVL
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Abstract
At Selete, correction for flare based on a flare point-spread function (PSFF) is investigated. We divide a layout into a grid and calculate pattern density for each grid square, obtaining a density array as an approximation to the layout aerial image. Then, the density array is convolved with the PSFF to create an array of flare values. Using this flare-value array, we resize the layout. In the above correction flow, size of a grid square of density array and a selection of an approximate function of the PSFF have a great influence on the accuracy of flare value computation. In this study, correction for flare was applied to the fabrication of several test masks using the real PSFF obtained from a full-field step-and-scan exposure tool called EUV1. We report on the optimization of size of grid square, on a suitable approximation model of PSFF, and on feedbacks from exposure experiments.
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Yukiyasu Arisawa, Yukiyasu Arisawa, Hajime Aoyama, Hajime Aoyama, Taiga Uno, Taiga Uno, Toshihiko Tanaka, Toshihiko Tanaka, Ichiro Mori, Ichiro Mori, } "Flare compensation for EUVL", Proc. SPIE 7271, Alternative Lithographic Technologies, 727145 (18 March 2009); doi: 10.1117/12.814187; https://doi.org/10.1117/12.814187
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