Methodologies for evaluating CD-matching of CD-SEM

Hiroki Kawada; Chih-Ming Ke; Ya-Chun Cheng; Yu-Hsi Wang

doi:10.1117/12.815186

23 March 2009 Methodologies for evaluating CD-matching of CD-SEM

Hiroki Kawada, Chih-Ming Ke, Ya-Chun Cheng, Yu-Hsi Wang

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72720Y (2009) https://doi.org/10.1117/12.815186
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

As CD-SEM's precision is severely controlled by sub-nanometer level, we have to evaluate not only repeatability of tools but also CD-matching between the individual tools. However, it is not easy to measure the CD-matching precisely ± 0.1nm due to repeatability error, stability change, carryover effect, statistical fluctuation of sampling, etc. varying in the individual tools. In this work uncertainty of ABBA test is experimentally estimated with self-ABBA test. Sample's carryover trend that dominates uncertainty of the test can be checked. Mathematical consideration implements precise calculation of the ABBA test.

Citation Download Citation

Hiroki Kawada, Chih-Ming Ke, Ya-Chun Cheng, and Yu-Hsi Wang "Methodologies for evaluating CD-matching of CD-SEM", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720Y (23 March 2009); https://doi.org/10.1117/12.815186

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