Haze generation model and prevention techniques for sulfate free cleaned mask

Manish Patil; Jong-Min Kim; Ik-Boum Hur; Sang-Soo Choi

doi:10.1117/12.816350

23 March 2009 Haze generation model and prevention techniques for sulfate free cleaned mask

Manish Patil, Jong-Min Kim, Ik-Boum Hur, Sang-Soo Choi

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72721X (2009) https://doi.org/10.1117/12.816350
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Although sulfate free cleaning has reduced number of residual ions on mask surface drastically, the lifetime of photomask has improved marginally. New haze generation mechanism in sulfate free cleaning has been studied and evaluated based on surface properties of photomask thin film materials. It was found that haze generation is co-related with substrate surface properties as well as ionic re-combination under ArF illumination. Based on the haze generation study, the surface modification treatment has been studied and investigated in the view of surface energy. The surface modification treatment increases storage lifetime as well as cumulative haze threshold energy in wafer shops.

Citation Download Citation

Manish Patil, Jong-Min Kim, Ik-Boum Hur, and Sang-Soo Choi "Haze generation model and prevention techniques for sulfate free cleaned mask", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72721X (23 March 2009); https://doi.org/10.1117/12.816350

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