23 March 2009 Focus and dose control for high-volume manufacturing of semiconductor
Author Affiliations +
Abstract
We have proposed a new inspection method of in-line focus and dose control for high-volume manufacturing of semiconductor. And we have referred to this method as "Focus and Dose Line Navigator (FDLN)". This method can raise a performance of semiconductor exposure tool and therefore they can go up a yield ratio of semiconductor device. The method leads the exposure condition (focus and dose) to the center of process window. FDLN calculates correct exposure condition using the technology of solving the inverse problem. The sequence involves following process. 1) Creating a focus exposure matrix (FEM) on a test wafer for building some models as supervised data. The models mean the relational equation between the multi measurement results of resist patterns (e.g. Critical dimension (CD), height and sidewall angle) and exposure conditions of FEM. 2) Measuring the resist patterns on production wafers and feeding the measurement data into the library to predict focus and dose. In this time, we have evaluated the accuracy of FDLN. We made some sample wafers by Canon's exposure tool "FPA-7000AS7". And we used Veeco's advanced CD-AFM "InSight" as a topography measurement tool.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Koichi Sentoku, Koichi Sentoku, Takeaki Ebihara, Takeaki Ebihara, Hideki Ina, Hideki Ina, } "Focus and dose control for high-volume manufacturing of semiconductor", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727238 (23 March 2009); doi: 10.1117/12.811776; https://doi.org/10.1117/12.811776
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT

High-volume manufacturing device overlay process control
Proceedings of SPIE (March 28 2017)
Focus and dose control to actual process wafer
Proceedings of SPIE (March 22 2008)
Focus and dose measurement method in volume production
Proceedings of SPIE (May 10 2005)
Multivariable versus univariable APC
Proceedings of SPIE (April 29 2004)
Focus and dose control for high volume manufacturing
Proceedings of SPIE (December 04 2008)

Back to Top