SCATT: software to model scatterometry using the rigorous electromagnetic theory

S. Babin; L. Doskolovich; Y. Ishibashi; A. Ivanchikov; N. Kazanskiy; I. Kadomin; T. Mikami; Y. Yamazaki

doi:10.1117/12.816904

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23 March 2009 SCATT: software to model scatterometry using the rigorous electromagnetic theory

S. Babin, L. Doskolovich, Y. Ishibashi, A. Ivanchikov, N. Kazanskiy, I. Kadomin, T. Mikami, Y. Yamazaki

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Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72723X (2009) https://doi.org/10.1117/12.816904
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Measurement of critical dimensions and vertical shape of features in semiconductor manufacturing is a critical task. Optical scatterometry proved capable of providing such measurements. In this paper, a software tool to model scatterometry was developed. Rigorous coupled wavelength analysis (RCWA) is used as a physical model. This software does not use fitting coefficients of any specific equipment and therefore is useful in understanding, analysis and optimization of measurements of specific patterns and potential sensitivity of methods and systems to process variation. Special attention was given to improve the accuracy and throughput of simulation; results of comparison to another software proved advantages of the developed software.

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S. Babin, L. Doskolovich, Y. Ishibashi, A. Ivanchikov, N. Kazanskiy, I. Kadomin, T. Mikami, and Y. Yamazaki "SCATT: software to model scatterometry using the rigorous electromagnetic theory", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723X (23 March 2009); https://doi.org/10.1117/12.816904

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