Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography

Adam J. Berro; Xinyu Gu; Naphtali O'Connor; Steffen Jockusch; Tomoki Nagai; Toshiyuki Ogata; Paul Zimmerman; Bryan J. Rice; Elizabeth Adolph; Travis Byargeon; Jose Gonzalez; Nicholas J. Turro; C. Grant Willson

doi:10.1117/12.814295

1 April 2009 Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography

Adam J. Berro, Xinyu Gu, Naphtali O'Connor, Steffen Jockusch, Tomoki Nagai, Toshiyuki Ogata, Paul Zimmerman, Bryan J. Rice, Elizabeth Adolph, Travis Byargeon, Jose Gonzalez, Nicholas J. Turro, C. Grant Willson

Author Affiliations +

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 72731B (2009) https://doi.org/10.1117/12.814295
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.

Citation Download Citation

Adam J. Berro, Xinyu Gu, Naphtali O'Connor, Steffen Jockusch, Tomoki Nagai, Toshiyuki Ogata, Paul Zimmerman, Bryan J. Rice, Elizabeth Adolph, Travis Byargeon, Jose Gonzalez, Nicholas J. Turro, and C. Grant Willson "Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731B (1 April 2009); https://doi.org/10.1117/12.814295

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