1 April 2009 Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography
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Abstract
Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.
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Adam J. Berro, Adam J. Berro, Xinyu Gu, Xinyu Gu, Naphtali O'Connor, Naphtali O'Connor, Steffen Jockusch, Steffen Jockusch, Tomoki Nagai, Tomoki Nagai, Toshiyuki Ogata, Toshiyuki Ogata, Paul Zimmerman, Paul Zimmerman, Bryan J. Rice, Bryan J. Rice, Elizabeth Adolph, Elizabeth Adolph, Travis Byargeon, Travis Byargeon, Jose Gonzalez, Jose Gonzalez, Nicholas J. Turro, Nicholas J. Turro, C. Grant Willson, C. Grant Willson, } "Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731B (1 April 2009); doi: 10.1117/12.814295; https://doi.org/10.1117/12.814295
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