Paper
1 April 2009 Theoretical analysis of development behavior of resist measured by QCM
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Abstract
Quartz-crystal-microbalance (QCM) data were simulated using the characteristic matrix method on a four-layer model. The calculated surfaces of resonance frequency and impedance visualize well their dependencies on the thickness of the dry layer, the thickness and the rigidity of the swelling layer during development. The ideal and swelling dissolutions by the Case II diffusion with high rigidity were analyzed using the same surface of the resonance frequency, which gives visually the condition for the Sauerbrey's relation. The larger thickness of swelling layer and the larger decrease of rigidity during the development show the undulating surfaces of the resonance frequency and impedance, which represent QCM traces with a single-peak, a double-peak or sequential double peaks during the development. The characteristic-matrix analysis has shown the validity of quantitative analysis of QCM data.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Minoru Toriumi "Theoretical analysis of development behavior of resist measured by QCM", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72732Y (1 April 2009); https://doi.org/10.1117/12.813939
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Cited by 2 scholarly publications.
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KEYWORDS
Data modeling

Diffusion

Protactinium

Crystals

Quartz

Visualization

Polymers

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