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1 April 2009 Incorporating organosilanes into EUV photoresists: diphenyltrimethylsilylmethylsulfonium triflate as a new PAG
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Abstract
The synthesis and characterization data for a new sulfonium photoacid generator (PAG), diphenyltrimethylsilylmethylsulfonium triflate (I), is reported. It is shown that the molecule undergoes rapid silyl group transfer to water or phenol in the presence of a strong, nucleophilic base such as trioctylamine (TOA). The resulting PAG, diphenyl-methylsulfonium triflate (II), is subsequently degraded by TOA via methyl group transfer from S to N leading to the formation of Ph2S and methyltriocylammonium triflate. Both I and II are stable when non-nucleophilic base quenchers are used. Dose-to-clear and patterning results obtained from EUV exposures at Intel-MET are presented, illustrating that increased sensitivity can be obtained with PAGs I and II relative to triphenylsulfonium triflate (TPSOTf), but that LWR is compromised.
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Shalini Sharma, Yoichi Ogata, Clarion Tung, James M. Blackwell, Todd R. Younkin, Yoshi Hishiro, Joshua S. Figueroa, and Arnold L. Rheingold "Incorporating organosilanes into EUV photoresists: diphenyltrimethylsilylmethylsulfonium triflate as a new PAG", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72733N (1 April 2009); https://doi.org/10.1117/12.814220
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