16 March 2009 Through-focus pattern matching applied to double patterning
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Abstract
A fast-CAD method for evaluating through-focus interaction among features is developed based on dual layout convolution kernels derived and tested for accuracy in predicting intensity changes. The model is derived by extending the Taylor series expansion for OPD to include a quadratic term, resulting in not only the usual pattern match factor Z3 for defocus, but also match factors for Z0 and Z8. The model is tested through-focus on a logic layout and the predicted intensity change versus the actual intensity change through-focus is graphed. Results for basic case near coherent illumination show an R2 of 0.92. Generalization to use only two patterns instead of three is shown to work well for line ends, with an R2 of 0.96.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juliet Rubinstein, Juliet Rubinstein, Andrew R. Neureuther, Andrew R. Neureuther, } "Through-focus pattern matching applied to double patterning", Proc. SPIE 7274, Optical Microlithography XXII, 72741A (16 March 2009); doi: 10.1117/12.814190; https://doi.org/10.1117/12.814190
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