16 March 2009 Feasibility of ultra-low k1 lithography for 28nm CMOS node
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We have designed the lithography process for 28nm node logic devices using 1.35NA scanner. In the 28nm node, we face on the ultra-low k1 lithography in which dense pattern is affected by the mask topography effect and the oblique-incidence. Using the rigorous lithography simulation considering the electro-magnetic field, we have estimated accurately the feasibility of resolution of the minimum pitch required in 28nm node. The optimum mask plate and illumination conditions have been decided by simulation. The experimental results for 28nm node show that the minimum pitch patterns and minimum SRAM cell are clearly resolved by single exposure.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shoji Mimotogi, Shoji Mimotogi, Kazuhiro Takahata, Kazuhiro Takahata, Takashi Murakami, Takashi Murakami, Seiji Nagahara, Seiji Nagahara, Kazuhiro Takeda, Kazuhiro Takeda, Masaki Satake, Masaki Satake, Yosuke Kitamura, Yosuke Kitamura, Tomoko Ojima, Tomoko Ojima, Hiroharu Fujise, Hiroharu Fujise, Yuriko Seino, Yuriko Seino, Tatsuhiko Ema, Tatsuhiko Ema, Hiroki Yonemitsu, Hiroki Yonemitsu, Manabu Takakuwa, Manabu Takakuwa, Shinichiro Nakagawa, Shinichiro Nakagawa, Takuya Kono, Takuya Kono, Masafumi Asano, Masafumi Asano, Suigen Kyoh, Suigen Kyoh, Hideaki Harakawa, Hideaki Harakawa, Akiko Nomachi, Akiko Nomachi, Tatsuya Ishida, Tatsuya Ishida, Shunsuke Hasegawa, Shunsuke Hasegawa, Katsura Miyashita, Katsura Miyashita, Makoto Tominaga, Makoto Tominaga, Soichi Inoue, Soichi Inoue, "Feasibility of ultra-low k1 lithography for 28nm CMOS node", Proc. SPIE 7274, Optical Microlithography XXII, 72741F (16 March 2009); doi: 10.1117/12.814040; https://doi.org/10.1117/12.814040

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