16 March 2009 Novel approaches to meet the requirements for double patterning
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In addition to hardware performance enhancement of exposure tool, new functions are needed to be developed to meet the required performance for realizing double patterning. New functions to improve overlay accuracy are advanced distortion control and stage control. We have developed a real-time lens magnification control system to enhance distortion control, which can make peel type, barrel type and trapezoid type of distortion shape, resulting in improving intra-shot overlay accuracy. Wafer stage grid control function can compensate for shot shift, shot rotation and magnification for each single shot, realizing drastic advancement in overlay accuracy. As for CD performance improvement, dose optimization is effective to compenste for CD uniformity according to CD metrology data from processed wafers. On the other hand, process window enhancement is performed by optimizing illumination mode with Canon's solution software k1 TUNE. In this paper, we will introduce these new functions.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takeaki Ebihara, Takeaki Ebihara, Toshiyuki Yoshihara, Toshiyuki Yoshihara, Hiroshi Morohoshi, Hiroshi Morohoshi, Tadamasa Makiyama, Tadamasa Makiyama, Yoshio Kawanobe, Yoshio Kawanobe, Koichiro Tsujita, Koichiro Tsujita, Toshiyuki Kojima, Toshiyuki Kojima, Kazuhiro Takahashi, Kazuhiro Takahashi, } "Novel approaches to meet the requirements for double patterning", Proc. SPIE 7274, Optical Microlithography XXII, 72741J (16 March 2009); doi: 10.1117/12.813585; https://doi.org/10.1117/12.813585

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