Pattern matching assisted modeling test pattern generation

Le Hong; Qiao Li; Jian Rao

doi:10.1117/12.814302

16 March 2009 Pattern matching assisted modeling test pattern generation

Le Hong, Qiao Li, Jian Rao

Proceedings Volume 7274, Optical Microlithography XXII; 727429 (2009) https://doi.org/10.1117/12.814302
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Generating test patterns with sufficient parameter space coverage has always been one of the critical steps towards building good OPC models. The advancement in technology node requires continues updates to OPC modeling test patterns. The traditional approach relies heavily on experiences gathered from older technology nodes. It often requires rounds of costly test tape out. Here we propose an automated flow for test pattern generation utilizing a fast full chip pattern matching algorithm. We describe the implementation of the flow. We also present experimental results and discuss the benefit and challenges of the proposed flow.

Citation Download Citation

Le Hong, Qiao Li, and Jian Rao "Pattern matching assisted modeling test pattern generation", Proc. SPIE 7274, Optical Microlithography XXII, 727429 (16 March 2009); https://doi.org/10.1117/12.814302

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