Arbitrary three-dimensional micro-fabrication by polymer grayscale lithography

Li Jiang; Pranay Nath; N. S. Korivi

doi:10.1117/12.814114

16 March 2009 Arbitrary three-dimensional micro-fabrication by polymer grayscale lithography

Li Jiang, Pranay Nath, N. S. Korivi

Proceedings Volume 7274, Optical Microlithography XXII; 72742L (2009) https://doi.org/10.1117/12.814114
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We report on the continuing development of a grayscale lithography technique based on the use of a polymeric grayscale photomask. Arbitrary three-dimensional (3D) microstructures can be realized in positive and negative photoresist materials by the use of the polymeric grayscale photomask with standard ultra-violet (UV) lithography. The fabrication of such 3D structures depends on the differential absorption of in photo-absorbing material. The photomask is made of patterned polydimethylsiloxane (PDMS) polymer doped with a UV absorbing laser dye. The PDMS photomask contains micro-patterns made by micro-molding the PDMS on a complementary silicon master mold. By adjusting the thickness of the patterns on the polymer photomask, the dopant dye concentration in the photomask and UV exposure dose, a multitude of unique 3D microstructures can be fabricated on the substrate with desired geometries and dimensions. While the feasibility of grayscale lithography with such a polymeric mask has been reported by us earlier, this paper describes the fabrication of master mold and polymeric grayscale photomask.

Citation Download Citation

Li Jiang, Pranay Nath, and N. S. Korivi "Arbitrary three-dimensional micro-fabrication by polymer grayscale lithography", Proc. SPIE 7274, Optical Microlithography XXII, 72742L (16 March 2009); https://doi.org/10.1117/12.814114

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