16 March 2009 Source optimization for three-dimensional image designs through film stacks
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Abstract
In this paper, we will outline the approach for optimizing the illumination conditions to print three-dimensional images in resist stacks of varying sensitivity in a single exposure. The algorithmic approach for acheiving both optimal common and weakest window is presented. Results will be presented which demonstrate the ability of the technique to create threedimensional structures. The performance of the common and weakest window formulation will be explored using this approach. Additionally, due to physical restrictions there are limitations to the type of patterns that can be printed with a single exposure in this manner, thus the abilities of such a technique will be explored.
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David O. S. Melville, David O. S. Melville, Alan E. Rosenbluth, Alan E. Rosenbluth, Kehan Tian, Kehan Tian, Dario Goldfarb, Dario Goldfarb, Stefan Harrer, Stefan Harrer, Matthew Colburn, Matthew Colburn, } "Source optimization for three-dimensional image designs through film stacks", Proc. SPIE 7274, Optical Microlithography XXII, 72743D (16 March 2009); doi: 10.1117/12.814700; https://doi.org/10.1117/12.814700
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