16 March 2009 True polarization characteristics of hyper-NA optics excluding impact of measurement system
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Proceedings Volume 7274, Optical Microlithography XXII; 72743K (2009); doi: 10.1117/12.813611
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
High lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces the vectorial effect. As a result, the vectorial effect has become more sensitive and vectorial fingerprint with higher accuracy has been required for effective image forming simulation. We successfully obtained true polarization characteristics of projection optics without the effect of measurement optics for more accurate image forming simulation. Accuracy of the result of separating Jones matrix of projection optics and that of measurement optics are presented.
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Toru Fujii, Ken-ichi Muramatsu, Noriyuki Matsuo, Yasihiro Ohmura, Masayasu Sawada, "True polarization characteristics of hyper-NA optics excluding impact of measurement system", Proc. SPIE 7274, Optical Microlithography XXII, 72743K (16 March 2009); doi: 10.1117/12.813611; https://doi.org/10.1117/12.813611
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KEYWORDS
Birefringence

Polarization

Optical testing

Projection systems

Crystals

Wavefronts

Lithography

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