Visit My Account to manage your email alerts.
2D design rule and layout analysis using novel large-area first-principles-based simulation flow incorporating lithographic and stress effects
Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators
Computational technology scaling from 32 nm to 28 and 22 nm through systematic layout printability verification
Implementing a framework to generate a unified OPC database from different EDA vendors for 45nm and beyond