12 March 2009 The nebulous hotspot and algorithm variability
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Abstract
Computation lithography relies on algorithms. These algorithms exhibit variability that can be as much as 5% (1 σ) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.
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Alfred K. K. Wong, Alfred K. K. Wong, Edmund Y. Lam, Edmund Y. Lam, } "The nebulous hotspot and algorithm variability", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 727509 (12 March 2009); doi: 10.1117/12.816449; https://doi.org/10.1117/12.816449
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