13 March 2009 Algorithm for determining printability and colouring of a target layout for double patterning
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Proceedings Volume 7275, Design for Manufacturability through Design-Process Integration III; 72750O (2009); doi: 10.1117/12.814321
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair of patterns which combine to produce the desired target layout. This is achieved via a cost function which encodes the geometry of the layout and allowable edge placement tolerances. If the layout is not printable by double patterning, then the algorithm provides a closest solution and indicates hotspots where the target is not feasible.
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Justin Ghan, Apo Sezginer, "Algorithm for determining printability and colouring of a target layout for double patterning", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750O (13 March 2009); doi: 10.1117/12.814321; https://doi.org/10.1117/12.814321
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KEYWORDS
Double patterning technology

Detection and tracking algorithms

Tolerancing

Spatial frequencies

Lithography

Photomasks

Fourier transforms

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