12 March 2009 Algorithm for determining printability and colouring of a target layout for double patterning
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Abstract
An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair of patterns which combine to produce the desired target layout. This is achieved via a cost function which encodes the geometry of the layout and allowable edge placement tolerances. If the layout is not printable by double patterning, then the algorithm provides a closest solution and indicates hotspots where the target is not feasible.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Justin Ghan, Apo Sezginer, "Algorithm for determining printability and colouring of a target layout for double patterning", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750O (12 March 2009); doi: 10.1117/12.814321; https://doi.org/10.1117/12.814321
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