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18 February 2009 Capillary Z-pinch discharge produced plasma EUV source
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Abstract
Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongpeng Zhao, Qiang Xu, and Xingqiang Zhang "Capillary Z-pinch discharge produced plasma EUV source", Proc. SPIE 7276, Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications, 72761J (18 February 2009); https://doi.org/10.1117/12.823433
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