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19 February 2009 The characteristic deviation compensation of guided-mode resonant filters
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Abstract
The compensation of the characteristic deviations of Guided mode resonant filters (GMRFs) induced by over-etching is obtained by the cover layer of GMRFs. The investigations of GMRFs are reported widely, but there are few reports about the preparation and commercial application of GMRFs. The reason for this is that the characteristics of GMRFs are strict with the error of preparation. The data of this paper shows the linear relationship between the grating depth and the resonant wavelength in the grating depth error range of 0-15 nm. Through choosing material and adjusting the thickness of cover layer, 10 nm deviations of GMRF resonant value induced by 12 nm etching errors is adjusted almost. It shows that within the minor fabrication errors range, the grating layer and waveguide layer has different degree influence on the resonant peak value of GMRF. This method of adjusting the preparing error is very useful in the preparing of GMRFs.
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Dawei Zhang, Yuanshen Huang, and Zhengji Ni "The characteristic deviation compensation of guided-mode resonant filters", Proc. SPIE 7279, Photonics and Optoelectronics Meetings (POEM) 2008: Optoelectronic Devices and Integration, 72791V (19 February 2009); https://doi.org/10.1117/12.823362
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