20 May 2009 Research of optical flats in pad polishing
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Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 72820X (2009) https://doi.org/10.1117/12.830815
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
The influence of polishing an optical workpiece with a polyurethane pad is examined in this paper, including material removal rate, surface roughness and surface form error. Usually, optical polishing pitch is applied to polish optical workpieces, but the material removal rate (MRR) of pitch is quite low, and polyurethane foam is thus substituted for polishing pitch. With the polyurethane pad a much higher MRR is obtained. Surface roughness and surface error form of workpieces are also examined. We are gratified to find that there is surface form error and surface roughness is comparable to the result of pitch polishing.
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Jian Wang, Jian Wang, Yinbiao Guo, Yinbiao Guo, Yaguo Lee, Yaguo Lee, Qiao Xu, Qiao Xu, Wei Yang, Wei Yang, } "Research of optical flats in pad polishing", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72820X (20 May 2009); doi: 10.1117/12.830815; https://doi.org/10.1117/12.830815
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