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20 May 2009 Methods for increasing the etching uniformity of ion beam multiple mask
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Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 728213 (2009) https://doi.org/10.1117/12.830822
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
With uniform illumination, multi-step diffractive optical elements (DOE) are fabricated with ion beam multiple mask etching technology. According to the technical process of ion beam multiple mask etching on DOE, a distribution of surface error based on LKJ-150 ion beam etching machine is presented. Numerical analysis indicates that the surface distribution of etching error results in lower performance of multi-step DOE, which consumedly reduces the uniformity of target field with uniform illumination. After each etching process, the sample i.e, multi-step DOE fabricated by LKJ-150 ion beam etching machine is measured. Through measurement data, we get the etching error. On the basis of etching error, the mask can be made. Numerical analysis shows this method can reduce the impact of surface error on the performance of DOE and increase the etching uniformity of. ion beam multiple mask
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaobo Zhang, Ying Xiong, Qiang Liu, and Yangchao Tian "Methods for increasing the etching uniformity of ion beam multiple mask", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728213 (20 May 2009); https://doi.org/10.1117/12.830822
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