Optical and electrochemical properties of the protonic state electrochromic device: NiOx/Ta2O5/WO3-x

Zhuying Li; Liu Ye; Minliang Zhang; Chonglou Shun

doi:10.1117/12.830861

20 May 2009 Optical and electrochemical properties of the protonic state electrochromic device: NiO_x/Ta₂O₅/WO_3-x

Zhuying Li, Liu Ye, Minliang Zhang, Chonglou Shun

Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 728217 (2009) https://doi.org/10.1117/12.830861
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

In the present investigation, the electrochromic properties of a protonic solid state device: WO₃ / Ta₂O₅ / NiO_x prepared at room temperature (300K) is reported. The non-stoichiometric tungsten oxide thin film (100nm), the tantalum oxide thin film (360nm) and the nickel oxide thin film (50nm) are prepared by RF magnetron sputtering technique on ITO coated glass; The transmittance variation for Li⁺ device is +30% and for Ta⁺ device is -2%. The optical band gap for WO3 film is 3.11eV, for WO₃ / Ta₂O₅ / NiO_x multilayer films is 2.98eV.

Citation Download Citation

Zhuying Li, Liu Ye, Minliang Zhang, and Chonglou Shun "Optical and electrochemical properties of the protonic state electrochromic device: NiO_x/Ta₂O₅/WO_3-x", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728217 (20 May 2009); https://doi.org/10.1117/12.830861

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