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20 May 2009 Optical and electrochemical properties of the protonic state electrochromic device: NiOx/Ta2O5/WO3-x
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Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 728217 (2009) https://doi.org/10.1117/12.830861
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
In the present investigation, the electrochromic properties of a protonic solid state device: WO3 / Ta2O5 / NiOx prepared at room temperature (300K) is reported. The non-stoichiometric tungsten oxide thin film (100nm), the tantalum oxide thin film (360nm) and the nickel oxide thin film (50nm) are prepared by RF magnetron sputtering technique on ITO coated glass; The transmittance variation for Li+ device is +30% and for Ta+ device is -2%. The optical band gap for WO3 film is 3.11eV, for WO3 / Ta2O5 / NiOx multilayer films is 2.98eV.
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Zhuying Li, Liu Ye, Minliang Zhang, and Chonglou Shun "Optical and electrochemical properties of the protonic state electrochromic device: NiOx/Ta2O5/WO3-x", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728217 (20 May 2009); https://doi.org/10.1117/12.830861
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