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20 May 2009 Optical properties of In-doped TiO2 thin films
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Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 72821D (2009) https://doi.org/10.1117/12.830869
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
A series of In-doped TiO2 thin films are deposited by magnetron sputtering technique on glass substrates. The quantities of In-element in these thin films are increased gradually. Scanning electron microscope, X-ray diffraction spectroscopy and UV-visible spectroscopy are used to investigate the surface morphology, crystal structure and absorption spectrum of film. The analysis of SEM results show that the surface morphology of film is granulated, and that the size of the granules in the film is about 20~30nm. The analysis of XRD results indicates that the crystalline structure of film cannot be confirmed from XRD patterns. In-element reduces the diffraction intensity of TiO2 film. Absorption spectrums suggest that absorption peak and absorption edge of the film change regularly according to variety of In-doped. The calculated value of optical constant of the film, bandgap, also changes regularly. O2 has significant effects on optical performance.
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Mingliang Zhang, Zhuying Li, Cunlou Sun, and Shaohong Yang "Optical properties of In-doped TiO2 thin films", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72821D (20 May 2009); https://doi.org/10.1117/12.830869
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