21 May 2009 Simulation of substrate temperature in HFCVD diamond thin films
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Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 72822O (2009) https://doi.org/10.1117/12.830994
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
The substrate temperature is one of the most important parameters for the synthesis of high quality diamond thin films in hot filament chemical vapor deposition (HFCVD) system. Based on the principle of heat transfer, the substrate temperature is calculated in the single hot filament system, the influence of filament height, filament diameter and filament length on substrate temperature are also discussed. Results show that the substrate temperatures vary with the space position. In the direction of parallel with the filament, the substrate temperatures vary smoothly, but, in the vertical direction of the filament, the substrate temperatures change acutely. When H=8mm, L=7cm and df=0.5mm, the substrate temperatures are well-distributed, this will give the support of some technique parameters for the growth of large area HFCVD diamond thin films.
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Yongjie Wang, Huijuan Wang, Zengqian Yin, "Simulation of substrate temperature in HFCVD diamond thin films", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72822O (21 May 2009); doi: 10.1117/12.830994; https://doi.org/10.1117/12.830994
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