20 May 2009 Model and simulation for testing two-mirror optical system by subaperture stitching interferometry
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Abstract
Two-mirror optical system has been widely used for large telescope, infrared and ultraviolet optical systems. Subaperture stitching interferometry technique has been developed for low cost and effective test of large optical system. The principle of error averaging subaperture stitching algorithm for testing two-mirror optical system wavefront is introduced in this paper. A two-mirror optical system is simulated by zemax software, a reasonable mathematical model is established and computer simulation experiment is carried out. Compared the stitching results with zemax software, the relative error of PV and RMS is 0.76% and -0.44%respectively. The PV and RMS of wavefront phase distribution residual are 0.0097λ and 0.0013λ .It is proved that the model and method are accurate and feasible to test optical system.
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Lihua Wang, Shibin Wu, Xi Hou, Long Kuang, Xuedong Cao, "Model and simulation for testing two-mirror optical system by subaperture stitching interferometry", Proc. SPIE 7283, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 72830Y (20 May 2009); doi: 10.1117/12.828624; https://doi.org/10.1117/12.828624
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