18 May 2009 Study on laser direct writing system for 32nm node
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Proceedings Volume 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 72840C (2009); doi: 10.1117/12.832070
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China
Abstract
In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized.
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Wenbo Jiang, Song Hu, Yong Yang, Lixin Zhao, Wei Yan, Shaolin Zhou, Wangfu Chen, "Study on laser direct writing system for 32nm node", Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840C (18 May 2009); doi: 10.1117/12.832070; https://doi.org/10.1117/12.832070
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KEYWORDS
Laser systems engineering

Lithography

Control systems

Computing systems

Photomasks

Image resolution

Silica

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