Simulation of surface plasmon nanolithography using tapered structure

Xingzhang Wei; Xiaochun Dong; Chunlei Du

doi:10.1117/12.834515

18 May 2009 Simulation of surface plasmon nanolithography using tapered structure

Xingzhang Wei, Xiaochun Dong, Chunlei Du

Proceedings Volume 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 72840O (2009) https://doi.org/10.1117/12.834515
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.

Citation Download Citation

Xingzhang Wei, Xiaochun Dong, and Chunlei Du "Simulation of surface plasmon nanolithography using tapered structure", Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840O (18 May 2009); https://doi.org/10.1117/12.834515

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KEYWORDS

Surface plasmons

Nanolithography

Optical lithography

Photomasks

Photoresist materials

Metals

Refractive index

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