Low temperature deposition of carbon nanotubes

Kyung-Nam Kang; Yoonyoung Jin; Pratul K. Ajmera; Sunggook Park

doi:10.1117/12.815578

31 March 2009 Low temperature deposition of carbon nanotubes

Kyung-Nam Kang, Yoonyoung Jin, Pratul K. Ajmera, Sunggook Park

Proceedings Volume 7291, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2009; 729112 (2009) https://doi.org/10.1117/12.815578
Event: SPIE Smart Structures and Materials + Nondestructive Evaluation and Health Monitoring, 2009, San Diego, California, United States

Abstract

We introduce a novel method for low substrate temperature carbon nanotube (CNT) deposition utilizing photo-chemical vapor deposition (PCVD). Aluminum and nickel catalyst layers are deposited on thermally oxidized silicon substrates for CNT growth. The catalyst layers of varying thicknesses are deposited by electron beam evaporation. Different catalyst annealing temperatures and pressures are investigated. The CNT deposition is carried out immediately following the annealing process. The presence of light source during CNT deposition assists in fragmentation of the CCl₄ precursor molecules used, thereby permitting a lower substrate temperature during growth. We have successfully deposited CNTs at substrate temperatures as low as 400 °C by this technique.

Citation Download Citation

Kyung-Nam Kang, Yoonyoung Jin, Pratul K. Ajmera, and Sunggook Park "Low temperature deposition of carbon nanotubes", Proc. SPIE 7291, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2009, 729112 (31 March 2009); https://doi.org/10.1117/12.815578

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