1 April 2009 Low temperature deposition of carbon nanotubes
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Abstract
We introduce a novel method for low substrate temperature carbon nanotube (CNT) deposition utilizing photo-chemical vapor deposition (PCVD). Aluminum and nickel catalyst layers are deposited on thermally oxidized silicon substrates for CNT growth. The catalyst layers of varying thicknesses are deposited by electron beam evaporation. Different catalyst annealing temperatures and pressures are investigated. The CNT deposition is carried out immediately following the annealing process. The presence of light source during CNT deposition assists in fragmentation of the CCl4 precursor molecules used, thereby permitting a lower substrate temperature during growth. We have successfully deposited CNTs at substrate temperatures as low as 400 °C by this technique.
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Kyung-Nam Kang, Yoonyoung Jin, Pratul K. Ajmera, Sunggook Park, "Low temperature deposition of carbon nanotubes", Proc. SPIE 7291, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2009, 729112 (1 April 2009); doi: 10.1117/12.815578; https://doi.org/10.1117/12.815578
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KEYWORDS
Annealing

Aluminum

Nanoparticles

Nickel

Carbon nanotubes

Light sources

Particles

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