Novel ultra-lightweight and high-resolution MEMS x-ray optics

Ikuyuki Mitsuishi; Yuichiro Ezoe; Utako Takagi; Makoto Mita; Raul Riveros; Hitomi Yamaguchi; Fumiki Kato; Susumu Sugiyama; Kouzou Fujiwara; Kohei Morishita; Kazuo Nakajima; Shinya Fujihira; Yoshiaki Kanamori; Noriko Y. Yamasaki; Kazuhisa Mitsuda; Ryutaro Maeda

doi:10.1117/12.823933

30 April 2009 Novel ultra-lightweight and high-resolution MEMS x-ray optics

Ikuyuki Mitsuishi, Yuichiro Ezoe, Utako Takagi, Makoto Mita, Raul Riveros, Hitomi Yamaguchi, Fumiki Kato, Susumu Sugiyama, Kouzou Fujiwara, Kohei Morishita, Kazuo Nakajima, Shinya Fujihira, Yoshiaki Kanamori, Noriko Y. Yamasaki, Kazuhisa Mitsuda, Ryutaro Maeda

Author Affiliations +

Proceedings Volume 7360, EUV and X-Ray Optics: Synergy between Laboratory and Space; 73600C (2009) https://doi.org/10.1117/12.823933
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

We have been developing ultra light-weight X-ray optics using MEMS (Micro Electro Mechanical Systems) technologies.We utilized crystal planes after anisotropic wet etching of silicon (110) wafers as X-ray mirrors and succeeded in X-ray reflection and imaging. Since we can etch tiny pores in thin wafers, this type of optics can be the lightest X-ray telescope. However, because the crystal planes are alinged in certain directions, we must approximate ideal optical surfaces with flat planes, which limits angular resolution of the optics on the order of arcmin. In order to overcome this issue, we propose novel X-ray optics based on a combination of five recently developed MEMS technologies, namely silicon dry etching, X-ray LIGA, silicon hydrogen anneal, magnetic fluid assisted polishing and hot plastic deformation of silicon. In this paper, we describe this new method and report on our development of X-ray mirrors fabricated by these technologies and X-ray reflection experiments of two types of MEMS X-ray mirrors made of silicon and nickel. For the first time, X-ray reflections on these mirrors were detected in the angular response measurements. Compared to model calculations, surface roughness of the silicon and nickel mirrors were estimated to be 5 nm and 3 nm, respectively.

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Ikuyuki Mitsuishi, Yuichiro Ezoe, Utako Takagi, Makoto Mita, Raul Riveros, Hitomi Yamaguchi, Fumiki Kato, Susumu Sugiyama, Kouzou Fujiwara, Kohei Morishita, Kazuo Nakajima, Shinya Fujihira, Yoshiaki Kanamori, Noriko Y. Yamasaki, Kazuhisa Mitsuda, and Ryutaro Maeda "Novel ultra-lightweight and high-resolution MEMS x-ray optics", Proc. SPIE 7360, EUV and X-Ray Optics: Synergy between Laboratory and Space, 73600C (30 April 2009); https://doi.org/10.1117/12.823933

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