The utilization of nanostructured materials for modern applications gained more and more importance during the last few
years. As examples super-fluorescent quantum dots, the use of carbon nano tubes (CNTs) in microelectronics,
electrospun fibers in filter membranes, thin film coatings for solar cells, mirrors or LEDs, semiconductor electronics, and
functionalized surfaces may be named to address only a few topics. To optimize the systems and enable the full range of
capabilities of nanostructures a thorough characterization of the surface-near topography (e.g. roughness, thickness,
lateral dimension) as well as of the chemical composition is essential.
As a versatile tool for spatial and chemical characterization XUV reflectometry, scatterometry and diffractometry is
proposed. Three different experimental setups have been realized evaluating spectral resolved reflectance under constant
incidence angle, angular resolved reflectance at a constant wavelength, or a combined approach using laboratory scaled
XUV sources to gain insight into chemical composition, film thickness and surface/interface roughness. Experiments on
near-edge X-ray absorption fine structure spectroscopy (NEXAFS) at the carbon K-edge have been performed. The
investigated systems range from synthetic polymers (PMMA, PI) over organic substances (humic acids) to biological
matter (lipids), delivering unique spectra for each compound. Thus NEXAFS spectroscopy using a table-top XUV source
could be established as a highly surface sensitive fingerprint method for chemical analysis. Future extended experiments
will investigate the silicon L-edge where e.g. silicon oxide interlayers below high-k or other nano-layered material on Sisubstrates
depict a technological important group of composite systems.