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22 May 2009 Recent progress in understanding the imaging and metrology using the helium ion microscope
Michael T. Postek; Andras E. Vladar; Bin Ming
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Proceedings Volume 7378, Scanning Microscopy 2009; 737808 (2009) https://doi.org/10.1117/12.824533
Event: SPIE Scanning Microscopy, 2009, Monterey, California, United States
Abstract
Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of these barriers. A new tool for imaging and metrology for nanotechnology is the scanning Helium Ion Microscope (HIM). The HIM is a new approach to imaging and metrology for nanotechnology which may be able to push this barrier lower. As a new methodology, it is just beginning to show promise and the number of potentially advantageous applications for nanotechnology and nanometrology has yet to be fully exploited. This presentation will discuss some of the progress made at NIST in collaboration with the manufacturing community in understanding the imaging and metrology for this new technology.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Michael T. Postek, Andras E. Vladar, and Bin Ming "Recent progress in understanding the imaging and metrology using the helium ion microscope", Proc. SPIE 7378, Scanning Microscopy 2009, 737808 (22 May 2009); https://doi.org/10.1117/12.824533
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