22 May 2009 Test objects for automated dimensional measurements at the nanoscale level using a scanning electron microscope
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Proceedings Volume 7378, Scanning Microscopy 2009; 737813 (2009) https://doi.org/10.1117/12.821759
Event: SPIE Scanning Microscopy, 2009, Monterey, California, United States
Abstract
Two types of test objects for automated measurements of critical dimensions with scanning electron microscopes (SEMs) are described. The first type can be used for SEM calibration along two coordinates in a wide range of magnifications (to perform dimensional measurements in the range from 10 nm to 100 μm without making recalibration), including determination of the electron beam diameter. The second type is recommended for embedding into the integrated circuits (ICs) to monitor the focusing of the SEM electron beam in the course of dimensional measurements of IC elements. Measurement and monitoring of the SEM magnification and electron beam diameter is necessary to measure the linewidth (the sizes of the upper and lower bases of the IC trapezoidal relief elements) in the nanometer range.
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V. P. Gavrilenko, V. P. Gavrilenko, M. N. Filippov, M. N. Filippov, Yu. A. Novikov, Yu. A. Novikov, A. V. Rakov, A. V. Rakov, P. A. Todua, P. A. Todua, } "Test objects for automated dimensional measurements at the nanoscale level using a scanning electron microscope", Proc. SPIE 7378, Scanning Microscopy 2009, 737813 (22 May 2009); doi: 10.1117/12.821759; https://doi.org/10.1117/12.821759
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